ASML is one of the world’s leading manufacturers of chip-making equipment.
Our vision is to enable affordable microelectronics that improve the quality of life.
To achieve this, our mission is to invent, develop, manufacture and service advanced technology for high-tech lithography, metrology and software solutions for the semiconductor industry.
ASML's guiding principle is continuing Moore's Law towards ever smaller, cheaper, more powerful and energy-efficient semiconductors. This results in increasingly powerful and capable electronics that enable the world to progress within a multitude of fields, including healthcare, technology, communications, energy, mobility, and entertainment.
The senior Material and Reliability & Lifetime architect proposes solutions to mitigate lifetime issues of pellicles by understanding thermal and mechanical phenomena in the film while exposed in an EUV lithography tool with increasing source power;The senior Material and Reliability & Lifetime architect should coordinate the membrane reliability and lifetime test strategy; overlooking all membrane thin film generations, giving directions to the development of the test strategy, managing the risks and learnings. Pro-actively leads setting-up new membrane film test related activities. Interfacing with scanner specifications and re-alignment based upon new film test performance insights/requirements.
The responsibility of the architect is to define what work packages are needed, what the priorities are, and to document these work packages and to get agreement on them.The architect will also have a firm role in the interfacing with internal (management) and external (suppliers, R&D partners) stakeholders of the membranes, as well as with related projects inside the company.
Context of the position
The department Wafer Clamping & Particle Contamination Control is part of the EUV Business Line in ASML. Its task is to specify, develop, integrate, qualify and industrialize wafer clamps, pellicles and particle contamination solutions in the area of EUV (Extreme Ultra Violet) Scanner Technology.
The Pellicle group is part of this department.The holder of the position reports to the manager EUV Pellicle and is operational within multidisciplinary projects.The group Pellicle is responsible for optimizing the EUV scanner performance by providing a membrane (pellicle) which can be applied in an EUV scanner.
The membranes should increase the defectivity performance of an EUV scanner without having negative impact on other performance parameters. The ASML NXE systems must be made such that they can operate with an EUV pellicle on the reticle, to protect the reticle from particles. Because the pellicle is in the EUV light path spectral effects require another membrane in the light path, as a spectral filter.
Both the material stack and the processing of the pellicle and the spectral filter membrane must be defined to meet the product performance as defined for the various generations of membranes.
University physics, material science, preferably PhD.
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Micro / Nano Technology
0 - 2 years
2 - 5 years
5 - 10 Years
|Job Location:||Veldhoven, Netherlands|
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